A true "tool person"! Taiwan power supply improves ASML EUV efficiency, increasing crystal production by 30 times in six years

Tech 9:25am, 23 September 2025 152

Tennium-electricity (TSMC) has made significant progress in improving the efficiency of ASML ultraviolet light (EUV) exposure machines. Since 2019,Tennium-electricity has increased the production of EUV crystals by 30 times with system optimization and self-developed thin film materials, and at the same time, power consumption has been reduced by 24%. As the world's largest EUV user, Taiwan Electric has about 200 machines, and more than 60 new units will be added from 2024 to 2025 to support advanced process expansion needs.

The core advantages of NTF come from the control of hardware and material supply chains, and even planned and transformed a 200-mph factory to produce self-developed EUV films, with performance exceeding the original ASML factory, demonstrating the integration of NTF processes and materials. The life of thin films increases by four times, the single wafer production capacity is increased by 4.5 times, and the defective products are greatly reduced.

After China first introduced EUV to the Kirin 9000 processor in 2019, Telco controlled more than 42% to 56% of the global EUV machine installation volume, and continued investment optimization process, including micro-tuning of exposure agents, exposure material improvement and predictive maintenance, significantly improving daily machine utilization and production efficiency. These results provide a solid foundation for the soon-to-machining 2 nanometers, and continue to strengthen the global semiconductor OEM status of Taiwan.

will focus on newly exposed materials and processes, and cooperate with the soon-to-machining high-number pore (High-NA) EUV system to continue to inspire industry innovation.

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